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Nanotechnology expert Antonio Facchetti joins HKUST from Georgia Tech in the US

Materials scientist and chemist Antonio Facchetti, formerly of the Georgia Institute of Technology in the United States, has joined the Hong Kong University of Science and Technology as a chair professor in its newly established department of materials. Facchetti, who was elected to the US National Academy of Engineering last year for his “contributions to the engineering of commercially viable electronic materials and devices”, researches semiconductors, dielectrics for thin-film and...

Read original at South China Morning Post

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